CVD: Разлика между версии

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редакция без резюме
Редакция без резюме
Редакция без резюме
Най-голямо приложение намират слоевете от силициев нитрид Si<sub>3</sub>N<sub>4</sub> и [[силициев диоксид]] SiO<sub>2</sub>.
== Допълнителни материали ==
* {{cite book |last=Jaeger |first=Richard C. |title=Introduction to Microelectronic Fabrication |edition=2nd |year=2002 |publisher=Prentice Hall |location=Upper Saddle River |isbn=0-201-44494-1 |chapter=Film Deposition}}
* {{cite book |last=Smith |first=Donald |title=Thin-Film Deposition: Principles and Practice |year=1995 |publisher=MacGraw-Hill |isbn=0-07-058502-4}}
* {{cite book |last=Dobkin and Zuraw |title=Principles of Chemical Vapor Deposition |year=2003 |publisher=Kluwer |isbn=1-4020-1248-9}}
* K. Okada "Plasma-enhanced chemical vapor deposition of nanocrystalline diamond" [ Sci. Technol. Adv. Mater. 8 (2007) 624] ''free-download review''
* T. Liu, D. Raabe and S. Zaefferer "A 3D tomographic EBSD analysis of a CVD diamond thin film" [ Sci. Technol. Adv. Mater. 9 (2008) 035013] ''free-download''
* Christoph Wild "CVD Diamond Properties and Useful Formula" [ CVD Diamond Booklet (2008) PDF] ''free-download''
* Dennis W. Hess, [ CHEMICAL VAPOR DEPOSITION OF DIELECTRIC AND METAL FILMS]''free-download'' from Electronic Materials and Processing: Proceedings of the First Electronic Materials and Processing Congress held in conjunction with the 1988 World Materials Congress Chicago, Illinois, USA, 24–30 September 1988, Edited by Prabjit Singh (Sponsored by the Electronic Materials and Processing Division of ASM INTERNATIONAL)